ʻO kēia ʻenehana pH sensor ʻoihana no ka hoʻomaʻemaʻe metala i hana kūikawā no ka hoʻomaʻemaʻe metala paʻakikī, ka hoʻoheheʻe ʻana a me nā kūlana hana ʻoihana mining. Hoʻohana i ke aniani -ikaika kiʻekiʻe -membrane aniani, kū i ka ʻakika ikaika, alkali ikaika, nā ion metala kaumaha a me ka wai slurry turbidity kiʻekiʻe.
ʻO ka hoʻolālā electrode i hoʻoikaika ʻia, anti-impact and anti{1}}scaling design, ana kūpaʻa i loko o ka ʻiʻo pulp, leachate, electrolytic solution a me ka wai ʻino metala. Uku 'ia-ma ka wela, IP68 piha wai, 3/4" NPT thread. Loa'a i ka hoailona analog a me RS485 puka kikoho'e, lō'ihi ke ola o ka lawelawe 'ana, ha'aha'a ka mālama 'ana ma nā wahi 'oihana ko'iko'i.
MTW-APH2521 Industrial pH Sensor for Metal Refining ua hoʻomohala ʻoihana no nā kūlana hana koʻikoʻi ma ka hoʻoheheʻe ʻana metala, ka ʻahuʻula a me nā ʻoihana hoʻomaʻemaʻe metallurgical. Ke ho'ohana 'ana i ka wela ki'eki'e -a me ka waika ikaika-base kū'ē i ka ipu aniani, hiki iā ia ke ana pa'a i ka waiwai pH ma ke ana wela ki'eki'e, ka alkali ikaika, ka iona metala kaumaha a me ka slurry puni honua.


Kūkulu ʻia kēia mea ʻike pH ʻoihana me ka hana anti-pollution a me -scaling maikaʻi loa, me ka pale pono ʻana i ka hoʻopili ʻana mai ka pauka mineral, ka wai ʻala a me ka slurry ʻōpala ʻoihana. Kākoʻo ia i ka uku pānaʻi ʻakomi, hoʻolako ʻia me ka RS485 MODBUS -RTU kikohoʻe puka kikohoʻe, maʻalahi ke hoʻohui ʻia me -pūnaewele hoʻomaʻemaʻe hoʻomaʻemaʻe pūnaewele, PLC a me nā lako ʻikepili.
Hoʻohui ʻia ka -ikaika ʻino-hale kūʻokoʻa, IP68 hoʻolālā wai piha, kūpono no ka manawa lōʻihi-hoʻokomo ʻia i loko o ka wai kaʻina hana metallurgical, wai kahe a me ka wai hoʻomaʻemaʻe. Hoʻemi nui ia i ka hoʻololi pinepine ʻana a me ka mālama ʻana i ke kumukūʻai, a e hōʻoia i ka mālama ʻana i ka pūnaewele paʻa i ke kaʻina hana hoʻoheheʻe holoʻokoʻa.
Hoʻohana nui ʻia ia i ka hoʻomaʻemaʻe metala, ka hoʻoili ʻana o ka mineral, ka hoʻoheheʻe ʻana i ka wai hoʻoheheʻe wai, ka nānā ʻana i ka wai wai flotation tank, ka wai electrolysis a me ka mālama ʻana i ka pH wai kemika metallurgical.
Nā Pōmaikaʻi Nui
- ʻO ke ʻano kumu kūʻē -corrosion ʻoihana, hoʻololi i ka wai ʻakika metallurgical-base
- ʻAʻole hiki ke ālai ʻia e ka pauda mineral
- Heluhelu paʻa i ka hāʻina hoʻonaʻauao ion kiʻekiʻe
- ʻO ke kūpaʻa ikaika ikaika, kūpono no ka hoʻokomo ʻana i ka paipu a me ka pahu immersion
- Kū'ē i ka corrosion kemika, hoʻonui nui i ke ola lawelawe
- Ma'alahi ma -ka ho'oma'ema'e a me ka calibration

Nā ʻāpana ʻenehana
|
ʻĀpana |
Laulā/ʻAno |
|
|
Laulā Ana |
0–14 pH |
|
|
Kaulana Mahana |
0–100 degere |
|
|
Paʻi Paʻi |
0–3 Bar, 6 Bar MAX |
|
|
Pānahana Uku |
NTC 2.252K, NTC 10K, NTC 22K, NTC 30K, PT100, PT1000, etc. (hiki ke koho) |
|
|
Kahua Hana |
>95% |
|
|
Kūʻē Membrane |
<250 MΩ |
|
|
ʻO ka hiki ʻole |
7 ± 0.25 pH |
|
|
Manawa pane |
<30 S |
|
|
ʻAno Alahaka paʻakai |
Porous ceramic core |
|
|
ʻAno Hōʻike |
ʻO ke alahaka paʻakai pālua |
|
|
Ka helu o na hui |
ʻelua |
|
|
Uila Kauʻi |
PG13.5 |
|
|
Mea Hale |
aniani |
|
|
Hohonu Hookomo |
120/150/225/325/425 mm (hiki ke hoʻololi ʻia) |
|
|
Hoʻohui Uila |
S8/S8M/S7/VP/K8S/K2, etc. (hiki ke hoʻololi ʻia) |



Palapala noi
Mea hoohehee metala
Mea hoʻoheheʻe minerala
Keena hoʻolei gula/keleawe/nickel ore
Electrolytic metallurgy laina hana
ka nānā ʻana i ka hoʻokuʻu ʻana i ka wai metala
ʻIke ʻia ka maikaʻi o ka wai ma lalo o ka honua
Hoʻohana Huahana








Nā huahana pale: ʻenehana ph sensor no ka hoʻomaʻemaʻe metala, Kina ʻenehana ph sensor no nā mea hana hoʻomaʻemaʻe metala, hale hana


